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Three-dimensional surface figure measurement of high-accuracy spherical mirror with nanoprofiler using normal vector
1Research Center for Ultra-Precision Science and Technology, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan.
The Review of Scientific Instruments
|May 3, 2014
Summary
A novel nanoprofiler measures high-accuracy mirrors without a reference surface, achieving sub-nanometer repeatability. This technology is crucial for next-generation lithography mirrors, enabling precise 3D shape reconstruction.
Area of Science:
- Optics and Metrology
- Advanced Manufacturing Technologies
Background:
- Next-generation lithography demands high-accuracy mirrors, particularly aspherical and free-form types.
- Conventional processing and measurement methods struggle to meet the stringent precision requirements for these advanced optics.
Purpose of the Study:
- To develop a novel nanoprofiler for measuring high-accuracy mirrors without relying on a reference surface.
- To enable precise 3D shape reconstruction of free-form mirrors for advanced optical applications.
Main Methods:
- Development of a novel nanoprofiler capable of measuring mirror surface figures independently of a reference surface.
- Utilizing an algorithm to process normal vectors and coordinate values for 3D shape reconstruction.
- Experimental validation using a concave spherical mirror with a 1000-mm radius of curvature.
Main Results:
- The nanoprofiler achieved a measurement repeatability of 0.6 nm for a concave spherical mirror.
- The measurement uncertainty was estimated at approximately 10 nm via numerical simulation.
- Results showed consistency with a Fizeau interferometer within the uncertainty range for the mirror's central region.
Conclusions:
- The developed nanoprofiler offers a promising solution for high-accuracy mirror metrology, crucial for extreme ultraviolet lithography.
- The reference-free measurement capability opens possibilities for measuring complex free-form optics.
- Further improvements in dynamic stiffness could enhance the nanoprofiler's repeatability beyond sub-nanometer levels.

