Topology optimization for optical projection lithography with manufacturing uncertainties.

Area of Science:

• Micro- and nano-device fabrication
• Optical projection lithography
• Topology optimization

Background:

• Photolithography is crucial for micro- and nano-device fabrication.
• Conventional methods involve separate blueprint design and optical proximity correction (OPC), which is inefficient.
• Manufacturing uncertainties can degrade device performance.

Purpose of the Study:

• To present a unified topology optimization approach for micro- and nano-devices.
• To incorporate photolithography processes and manufacturing uncertainties directly into the optimization.
• To eliminate the need for separate optical proximity correction (OPC) steps.

Main Methods:

• Developed a topology optimization framework that integrates photolithography simulation.
• Included manufacturing uncertainties (process variations) within the optimization loop.
• Formulated a single optimization problem to achieve both performance and manufacturability.

Main Results:

• Generated binary masks directly suitable for optical projection lithography manufacturing.
• Achieved robust device performance against considered process variations.
• Demonstrated a unified approach solving one optimization problem instead of two separate ones.

Conclusions:

• The proposed unified approach enables simultaneous optimization of device performance and manufacturability.
• Eliminates the need for post-design optical proximity correction (OPC).
• Shows potential for efficient micro- and nano-device design and fabrication, as exemplified by a micro-gripper.