Updated: Apr 30, 2026

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices
Published on: January 27, 2017
A E Vasdekis1, M J Wilkins, J W Grate
1Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, PO Box 999, Richland, WA 99352, USA. andreas.vasdekis@pnnl.gov.
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Solvent Immersion Imprint Lithography (SIIL) enables deep feature imprinting and 3D polymer functionalization. This novel technique simplifies microsystem prototyping for applications like microfluidics and biosensors.
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