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Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
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Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry.

Xiuguo Chen, Shiyuan Liu, Chuanwei Zhang

    Optics Express
    |July 1, 2014
    PubMed
    Summary

    Mueller matrix ellipsometry (MME) offers superior nanoimprint lithography characterization. This technique accurately quantifies resist pattern dimensions and residual layer thickness, ensuring high imprint fidelity.

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    Area of Science:

    • Nanotechnology
    • Optical Metrology
    • Materials Science

    Background:

    • Accurate characterization of nanoimprinted resist patterns is crucial for controlling nanoimprint lithography (NIL) processes and achieving high fidelity.
    • Optical scatterometry offers a high-throughput, low-cost, and minimally damaging approach for NIL pattern analysis.

    Purpose of the Study:

    • To investigate the potential of Mueller matrix ellipsometry (MME) based scatterometry for enhanced characterization of nanoimprinted resist patterns.
    • To demonstrate the capability of MME to extract detailed structural parameters and assess imprint pattern fidelity.

    Main Methods:

    • Utilized an in-house developed Mueller matrix ellipsometer for characterizing nanoimprinted resist patterns.
    • Employed MME scatterometry, leveraging the rich information from a 4x4 Mueller matrix.
    • Incorporated depolarization effects into the optical model for improved accuracy.

    Main Results:

    • Achieved more accurate quantification of nanoimprinted resist pattern parameters, including line width, line height, and sidewall angle.
    • Successfully determined residual layer thickness and its variation across the illumination spot.
    • Demonstrated excellent imprint pattern fidelity through MME-extracted profile comparisons.

    Conclusions:

    • MME-based scatterometry provides significantly more detailed and accurate information compared to conventional optical methods for NIL.
    • Optimal measurement configurations and incorporation of depolarization effects enhance MME's characterization capabilities.
    • MME is a powerful tool for ensuring and verifying high fidelity in nanoimprint lithography processes.