Updated: Apr 27, 2026

Optimized Fabrication Procedure for High-Quality Graphene-based Moiré Superlattice Devices
Published on: July 11, 2025
Insung Choi1, Hu Young Jeong, Dae Yool Jung
1Department of Materials Science and Engineering and ‡Department of Electrical Engineering and Graphene Research Center, Korea Advanced Institute of Science and Technology (KAIST) , Daejeon 305-701, Republic of Korea.
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Researchers developed a new solid-phase synthesis for doped graphene using pulsed laser irradiation on silicon carbide (SiC). This direct growth method avoids complex transfer steps, enabling high-performance graphene electronic devices.
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