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Three-dimensional photonic crystals created by single-step multi-directional plasma etching
Optics Express
|August 5, 2014
Summary
We developed a new 3D photonic nanostructure fabrication method using multi-directional plasma etching. This technique creates silicon photonic crystals with a complete photonic bandgap for optical communication wavelengths.
Area of Science:
- Nanotechnology
- Photonics
- Materials Science
Background:
- Fabricating complex 3D photonic nanostructures is challenging.
- Controlling plasma etching for precise 3D structures requires advanced techniques.
Purpose of the Study:
- To develop a simple and flexible method for fabricating 3D photonic nanostructures.
- To demonstrate the formation of a complete photonic bandgap in silicon photonic crystals.
Main Methods:
- Simultaneous multi-directional plasma etching.
- Controlling the ion-sheath in reactive-ion-etching equipment.
- Fabrication on single-crystalline silicon wafers.
Main Results:
- Achieved high reflectance (>95%) and low transmittance (<-15dB) at optical communication wavelengths.
- Demonstrated a complete photonic bandgap in silicon-based 3D photonic crystals.
- Showcased photonic bandgap effect at shorter wavelengths (~0.6 μm).
Conclusions:
- The developed plasma etching method is effective for creating 3D photonic crystals.
- The fabricated structures exhibit properties suitable for optical communication.
- The method shows potential for creating fine structures at shorter wavelengths.
