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The Patterning of Sub-500 nm Inorganic Oxide Structures
Meredith J Hampton1, Stuart S Williams, Zhilian Zhou
1Department of Chemistry University of North Carolina at Chapel Hill CB #3290, Caudill Labs, Chapel Hill, NC 27599 (USA).
Advanced Materials (Deerfield Beach, Fla.)
|September 13, 2014
Abstract:
Elastomeric perfluoropolyether molds are applied to pattern arrays of sub-500 nm inorganic oxide features. This versatile soft-lithography technique can be used to pattern a wide range of materials; in this work inorganic oxides including TiO2 , SnO2 , ZnO, ITO, and BaTiO3 are patterned on a variety of substrates with different aspect ratios. An example of TiO2 posts is shown in the figure.
