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Updated: Apr 22, 2026

Epitaxial Nanostructured α-Quartz Films on Silicon: From the Material to New Devices
Published on: October 6, 2020
Bottom-up nanostructured bulk silicon: a practical high-efficiency thermoelectric material
Aikebaier Yusufu1, Ken Kurosaki, Yoshinobu Miyazaki
1Graduate School of Engineering, Osaka University, Suita 565-0871, Japan. kurosaki@see.eng.osaka-u.ac.jp.
Abstract:
The effectiveness of thermoelectric (TE) materials is quantified by the dimensionless figure of merit (zT). An ideal way to enhance zT is by scattering phonons without scattering electrons. Here we show that, using a simple bottom-up method, we can prepare bulk nanostructured Si that exhibits an exceptionally high zT of 0.6 at 1050 K, at least three times higher than that of the optimized bulk Si. The nanoscale precipitates in this material connected coherently or semi-coherently with the Si matrix, effectively scattering heat-carrying phonons without significantly influencing the material's electron transport properties, leading to the high zT.

