Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Region selective super-resolution imaging lithography for 3D via fabrication.

Optics express·2026
Same author

Application of cervical combined with bilateral uterine cornual injection of tracer in sentinel lymph node mapping of early endometrial cancer.

BMC cancer·2026
Same author

Plasmonic lithography fast imaging model based on the decomposition machine learning method under arbitrary illumination system.

Optics express·2026
Same author

A Two-Stage Unet Framework for Sub-Resolution Assist Feature Prediction.

Micromachines·2025
Same author

Target recognition and grasping strategies for soft robotic manipulators in unstructured environments.

The Review of scientific instruments·2025
Same author

Fast simulation method of lithography latent image on non-planar wafer for large area mask.

Optics express·2025

Related Experiment Video

Updated: Apr 22, 2026

Microfabrication of Implantable Optics Integrated in a Microstructured Imaging Window for Advanced In Vivo Imaging
07:14

Microfabrication of Implantable Optics Integrated in a Microstructured Imaging Window for Advanced In Vivo Imaging

Published on: April 11, 2025

1.3K

Inverse pupil wavefront optimization for immersion lithography.

Chunying Han, Yanqiu Li, Lisong Dong

    Applied Optics
    |October 17, 2014
    PubMed
    Summary
    This summary is machine-generated.

    This study introduces an inverse pupil wavefront optimization (PWO) method to correct thick mask induced aberration (TMIA) in integrated circuit lithography. The novel approach significantly enhances image fidelity and process window, overcoming limitations of traditional PWO techniques.

    More Related Videos

    Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
    07:39

    Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons

    Published on: July 21, 2018

    6.5K
    A Guide to Structured Illumination TIRF Microscopy at High Speed with Multiple Colors
    11:15

    A Guide to Structured Illumination TIRF Microscopy at High Speed with Multiple Colors

    Published on: May 30, 2016

    26.9K

    Related Experiment Videos

    Last Updated: Apr 22, 2026

    Microfabrication of Implantable Optics Integrated in a Microstructured Imaging Window for Advanced In Vivo Imaging
    07:14

    Microfabrication of Implantable Optics Integrated in a Microstructured Imaging Window for Advanced In Vivo Imaging

    Published on: April 11, 2025

    1.3K
    Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
    07:39

    Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons

    Published on: July 21, 2018

    6.5K
    A Guide to Structured Illumination TIRF Microscopy at High Speed with Multiple Colors
    11:15

    A Guide to Structured Illumination TIRF Microscopy at High Speed with Multiple Colors

    Published on: May 30, 2016

    26.9K

    Area of Science:

    • Semiconductor manufacturing
    • Optical lithography
    • Integrated circuit fabrication

    Background:

    • Thick mask induced aberration (TMIA) significantly impacts lithography image quality as critical dimensions shrink.
    • Existing pupil wavefront optimization (PWO) methods struggle with analytical relationships and limited optimization scope (e.g., only spherical aberrations).
    • Traditional PWO algorithms are computationally intensive and offer restricted degrees of freedom for aberration compensation.

    Purpose of the Study:

    • To develop an advanced PWO method that analytically models and compensates for TMIA.
    • To overcome the limitations of traditional PWO approaches by expanding the optimization to include multiple aberration terms.
    • To improve image fidelity and process window in advanced lithography.

    Main Methods:

    • Established an analytical relationship between pupil wavefront and cost function using Abbe vector imaging theory.
    • Developed an inverse PWO method incorporating the analytical model.
    • Employed the Fletcher-Reeves conjugate-gradient algorithm for optimization.
    • Optimized for TMIA encompassing 37 Zernike terms.

    Main Results:

    • The inverse PWO method effectively balances TMIA, including 37 Zernike terms.
    • Simulation results demonstrate a significant improvement in image fidelity.
    • The optimized process exhibits a larger, more robust process window.
    • The approach successfully compensates for focus exposure matrix tilt and best focus shift.

    Conclusions:

    • The developed inverse PWO method provides an effective solution for TMIA in advanced lithography.
    • This approach overcomes the limitations of traditional PWO by offering analytical modeling and broader aberration compensation.
    • The enhanced image fidelity and process window highlight the practical applicability of this technique for next-generation integrated circuits.