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Spontaneous exfoliation and tailoring of MoS2 in mixed solvents
1State Key Laboratory of Molecular Engineering of Polymers of Ministry of Education, Department of Macromolecular Science, Fudan University, Shanghai, 200433, P. R. China. hongbinlu@fudan.edu.cn.
Chemical Communications (Cambridge, England)
|November 11, 2014
Abstract:
Spontaneous exfoliation of MoS2 is achieved in H2O2-NMP mixed solvents with a yield of over 60 wt%, operated under mild conditions. H2O2-prompted sheet-tailoring effect induces a size evolution of MoS2 nanosheets from micro-scale to nano-scale. Furthermore, the concurrent dissolution also affords an approach to introduce structural defects in the nanosheets.
