Metal-Semiconductor Junctions
Biasing of Metal-Semiconductor Junctions
Biasing of FET
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Updated: Apr 20, 2026

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
1Department of Physics and Astronomy, University of Nebraska, Lincoln, Nebraska 68588, USA.
Graphene electrodes enhance ferroelectric tunnel junction (FTJ) performance by controlling interface properties. An ammonia layer significantly boosts the tunneling electroresistance effect in these FTJ devices.
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