High channel count and high precision channel spacing multi-wavelength laser array for future PICs.

Area of Science:

• Optoelectronics
• Photonics
• Semiconductor Devices

Background:

• Multi-wavelength semiconductor laser arrays (MLAs) are crucial for wavelength division multiplexing (WDM) networks.
• Wavelength precision and fabrication cost hinder widespread MLA adoption.

Purpose of the Study:

• To develop high channel count MLAs with precise wavelength control.
• To reduce fabrication costs using standard lithography techniques.
• To improve wavelength stability and single longitudinal mode (SLM) yield.

Main Methods:

• Utilized low-cost standard micrometer-level photolithography/holographic lithography.
• Employed the reconstruction-equivalent-chirp (REC) technique for precise wavelength determination.
• Applied an equivalent phase shift technique to enhance SLM yield.

Main Results:

• Demonstrated 60-wavelength MLAs with uniform wavelength spacing.
• Achieved high wavelength precision with nearly 83% of lasers within ±0.20 nm deviation.
• Obtained nearly 100% single longitudinal mode (SLM) yield, significantly higher than standard DFB lasers.

Conclusions:

• The developed MLAs offer precise wavelength control and high SLM yield at reduced fabrication costs.
• This approach addresses critical limitations hindering MLA deployment in WDM networks.
• The technology shows significant potential for advancing optical communication systems.