Atomic layer deposition encapsulated activated carbon electrodes for high voltage stable supercapacitors

Kijoo Hong1, Moonkyu Cho, Sang Ouk Kim

  • 1Department of Materials Science and Engineering, KAIST, Center for Nanomaterials and Chemical Reactions, Institute for Basic Science (IBS) , Daejeon 305-701, Republic of Korea.

Summary

Atomic layer deposition (ALD) enhances activated carbon stability for high-voltage supercapacitors. This surface modification boosts energy density and extends operational lifespan, offering a general method for carbon materials.

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