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Updated: Apr 17, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Development of a monochromator for aberration-corrected scanning transmission electron microscopy
Masaki Mukai1, Eiji Okunishi2, Masanori Ashino2
1JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan mmukai@jeol.co.jp.
Abstract:
In this article, we report the development of a new 200-kV analytical electron microscope equipped with a monochromator with an integrated double Wien-filter system. It enables us to study the electronic structures of materials in detail using electron energy-loss spectroscopy (EELS) analysis at an atomic scale. A highly monochromated and isotropically round electron probe is produced on the specimen plane. The ultimate energy resolutions with 0.1-s acquisition times are measured to be 36 meV at 200 kV and 30 meV at 60 kV. In an EELS mapping experiment performed on SrTiO3 with a monochromated electron probe whose energy resolution is 146 meV, an elemental map exhibits atomic resolution.
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