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Improved deep-etched multilayer grating reconstruction by considering etching anisotropy and abnormal errors in

Jinlong Zhu, Shiyuan Liu, Hao Jiang

    Optics Letters
    |February 14, 2015
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    Summary

    This study improves nanostructure reconstruction for better etching process control. Novel methods enhance accuracy by accounting for model errors and measurement noise in optical scatterometry.

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    Area of Science:

    • Nanotechnology
    • Materials Science
    • Optical Metrology

    Background:

    • Accurate reconstruction of etched nanostructures is crucial for process control and manufacturing yield.
    • Existing methods struggle with nonuniform side-wall angles (SWA) due to material anisotropies and measurement errors.

    Purpose of the Study:

    • To develop an improved method for deep-etched multilayer grating reconstruction.
    • To enhance accuracy and fidelity in nanostructure fabrication through better process control.

    Main Methods:

    • Simultaneously considering model error from nonuniform SWA in multilayer gratings.
    • Employing a robust statistics-based method to suppress measurement errors in optical scatterometry.
    • Introducing an additional parameter to refine the profile model and using robust estimation with the Gauss-Newton (GN) method.

    Main Results:

    • Achieved more accurate reconstruction of deep-etched multilayer gratings.
    • Successfully addressed challenges posed by nonuniform SWA and measurement noise.
    • Demonstrated improved fidelity and potential for higher manufacturing yield.

    Conclusions:

    • The proposed methods significantly enhance the accuracy of nanostructure reconstruction.
    • This approach offers a more robust and reliable solution for optical scatterometry in nanostructure metrology.
    • Improved reconstruction accuracy directly contributes to better etching process control and manufacturing outcomes.