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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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Synthesis and characterization of ion-imprinted resin for selective removal of UO2 (II) ions from aqueous medium

M Monier1, Raedah A S Alatawi, D A Abdel-Latif

  • 1Chemistry Department, Deanery of Academic Services, Taibah University, Yanbu Branch, Yanbu El-Bahr, KSA; Chemistry Department, Faculty of Science, Mansoura University, Mansoura, 35516, Egypt.

Journal of Molecular Recognition : JMR
|March 11, 2015
PubMed

Keywords:
heavy metalsion-imprintingphenol resin

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