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Post-treatment-Free Solution-Processed Non-stoichiometric NiO(x) Nanoparticles for Efficient Hole-Transport Layers of

Fei Jiang1, Wallace C H Choy, Xinchen Li

  • 1Department of Electrical and Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong, PR China.

Advanced Materials (Deerfield Beach, Fla.)
|March 31, 2015
PubMed
Abstract

No abstract available in PubMed .

Keywords:
hole-transport layersnickel oxideorganic optoelectronic devicespost-treatment-freetransition metal oxides

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