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Updated: Apr 14, 2026

Polymeric Microneedle Array Fabrication by Photolithography

Polymeric Microneedle Array Fabrication by Photolithography

Published on: November 17, 2015

Nano-LED array fabrication suitable for future single photon lithography.

M Mikulics¹, H Hardtdegen

¹Peter Grünberg Institut (PGI-9), Forschungszentrum Jülich, 52425 Jülich, Germany. Jülich-Aachen Research Alliance, Fundamentals of Future Information Technology (JARA-FIT), 52425 Jülich, Germany.

|April 16, 2015

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Researchers developed a novel lithography illumination concept using nano light-emitting diodes (LEDs) as single-photon emitters. This approach demonstrates the feasibility of achieving ultimate scale limits in mass production for advanced manufacturing.

Area of Science:

Optics and Photonics
Nanotechnology
Semiconductor Devices

Background:

Current lithography techniques face limitations in achieving ultimate scale limits for mass production.
Single-photon emitters offer a potential pathway to overcome these limitations.
Nano light-emitting diodes (LEDs) are promising candidates for controlled single-photon emission.

Purpose of the Study:

To present an alternative illumination concept for future lithography based on single-photon emitters.
To detail the technological steps required for implementing this novel lithography approach.
To assess the feasibility and potential of using nano-LEDs for advanced lithography.

Main Methods:

Fabrication and integration technology development for nano light-emitting diodes (LEDs).

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Last Updated: Apr 14, 2026

Polymeric Microneedle Array Fabrication by Photolithography

Polymeric Microneedle Array Fabrication by Photolithography

Published on: November 17, 2015

Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography

Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography

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Assessment of the optical characteristics of the developed nano-LEDs.

Electrical driving and array-based illumination using size-controlled nano-LEDs.

Lithographical formation of nanostructures to demonstrate the approach's feasibility.

Main Results:

Successful fabrication and integration of nano light-emitting diodes (LEDs).
Demonstrated electrical driving and controlled illumination using nano-LEDs in an array.
Lithographical formation of nanostructures validating the proposed illumination concept.
Assessment of optical characteristics indicating suitability for lithography applications.

Conclusions:

The developed nano light-emitting diode (LED) based illumination concept is feasible for future lithography.
This approach shows significant potential for reaching ultimate scale limits in mass production.
Further technological advancements in nano-LEDs can drive the next generation of high-resolution lithography.