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Updated: Apr 14, 2026

Polymeric Microneedle Array Fabrication by Photolithography
Published on: November 17, 2015
Nano-LED array fabrication suitable for future single photon lithography
1Peter Grünberg Institut (PGI-9), Forschungszentrum Jülich, 52425 Jülich, Germany. Jülich-Aachen Research Alliance, Fundamentals of Future Information Technology (JARA-FIT), 52425 Jülich, Germany.
Abstract:
We report on an alternative illumination concept for a future lithography based on single-photon emitters and important technological steps towards its implementation. Nano light-emitting diodes (LEDs) are chosen as the photon emitters. First, the development of their fabrication and their integration technology is presented, then their optical characteristics assessed. Last, size-controlled nano-LEDs, well positioned in an array, are electrically driven and utilized for illumination. Nanostructures are lithographically formed, demonstrating the feasibility of the approach. The potential of single-photon lithography to reach the ultimate scale limits in mass production is discussed.

