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Updated: Apr 13, 2026

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Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
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Effect of sapphire nitridation and group-III source flow rate ratio on In-incorporation into InGaN grown by
Journal of Nanoscience and Nanotechnology
|May 5, 2015
Abstract:
In-composition of N-polar InGaN films on the sapphire substrate with the surface nitridation was investigated. By varying the ratio of the group-III source flow rate from 0.7 to 0.95, the In-composition and the surface morphologies of InGaN films were changed. The In-composition of N-polar InGaN films was affected by the strain relaxation and the surface morphologies.

