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In Situ Time-dependent Dielectric Breakdown in the Transmission Electron Microscope: A Possibility to Understand the Failure Mechanism in Microelectronic Devices
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Mobility degradation mechanisms of MOSFETs with a high-k dielectric layer

Hyun Soo Jung, Ju Tae Ryu, Dong Hun Kim

    Journal of Nanoscience and Nanotechnology
    |May 12, 2015
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