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Updated: Apr 11, 2026

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
Published on: December 16, 2011
Jorik van de Groep1, Pierpaolo Spinelli1,2, Albert Polman1
1†Center for Nanophotonics, FOM Institute AMOLF, Science Park 104, 1098 XG Amsterdam, The Netherlands.
This study presents a novel nanopatterned antireflection coating using sol-gel and soft-imprint technology. The developed nanoglass coating significantly reduces reflection on glass surfaces, enhancing optoelectronic device performance.
10:49Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
Published on: January 23, 2013
11:24Fabrication of Gradient Nanopattern by Thermal Nanoimprinting Technique and Screening of the Response of Human Endothelial Colony-forming Cells
Published on: July 1, 2018
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