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Related Concept Videos

Characteristics and Nomenclature of Copolymers01:24

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Copolymers are the products obtained from the polymerization of multiple monomer species. So, in a polymer chain itself, there can be multiple repeating units that come from different monomers. The process of synthesizing a polymer from different monomer species is called copolymerization. When two monomers are involved, the polymer is known as a bipolymer. Polymers with three and four monomers are termed terpolymers and quaterpolymers, respectively. Figure 1 depicts the copolymerization of...
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Step-growth or condensation polymerization is a stepwise reaction of bi or multifunctional monomers to form long-chain polymers. As all the monomers are reactive, most of the monomers are consumed at the early stages of the reaction to form small chains of reactive oligomers, which then combine to form long polymer chains in the late stages. Hence, the reaction has to proceed for a long time to achieve high molecular weight polymers.
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The cationic polymerization mechanism consists of three steps: initiation, propagation, and termination. In the initiation step of the polymerization process, the π bond of a monomer gets protonated by the Lewis acid catalyst, which is formed from boron trifluoride and water. The protonation of the π bond generates a carbocation stabilized by the electron‐donating group. In the propagation step, the π bond of the second monomer acts as a nucleophile and attacks the...
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Related Experiment Video

Updated: Apr 11, 2026

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One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers.

Tomoyasu Hirai1, Melvina Leolukman2, Chi Chun Liu3

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Advanced Materials (Deerfield Beach, Fla.)
|June 5, 2015
PubMed
Summary

Organic-inorganic block copolymers self-assemble into nanostructures via solvent annealing. These structures are then converted into a hard silica mask using oxygen plasma etching, creating features under 10 nm.

Keywords:
POSSblock copolymerhigh etching resistancehybrid material

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Polymer Chemistry

Background:

  • Block copolymers (BCP) are crucial for creating nanoscale patterns.
  • Self-assembly of BCPs offers a scalable route to nanostructure fabrication.
  • Controlling BCP thin-film morphology is key for advanced lithography.

Purpose of the Study:

  • To demonstrate a simple method for self-assembling organic-inorganic BCPs in thin films.
  • To convert BCP nanostructures into a durable silica hard mask.
  • To achieve highly ordered, vertically oriented nanostructures with sub-10 nm feature sizes.

Main Methods:

  • Solvent annealing of organic-inorganic BCPs on unmodified substrates.
  • Highly selective oxygen plasma etching to convert BCP structures into silica.
  • Characterization of self-assembled and etched nanostructures.

Main Results:

  • Successful vertical self-assembly of lamellae and cylinders from BCPs.
  • Formation of a robust silica mask with high fidelity to the BCP template.
  • Achieved cylinder nanostructures with feature sizes below 10 nm.

Conclusions:

  • Simple solvent annealing and oxygen plasma etching provide an effective route for BCP nanostructure fabrication.
  • This method enables the creation of high-resolution silica masks for nanolithography.
  • The sub-10 nm feature size achieved opens possibilities for next-generation semiconductor patterning.