"Multipoint Force Feedback" Leveling of Massively Parallel Tip Arrays in Scanning Probe Lithography
Hanaul Noh1, Goo-Eun Jung1,2, Sukhyun Kim1
1Research and Development Center, Park Systems, Suwon, 443-270, South Korea.
Small (Weinheim an Der Bergstrasse, Germany)
|June 18, 2015
Summary
A novel leveling method for polymer pen lithography ensures uniform nanoscale patterning by precisely controlling applied forces. This advancement enables high-precision, large-area nanofabrication with parallel tip arrays.
Area of Science:
- Materials Science
- Nanotechnology
- Mechanical Engineering
Background:
- Massively parallel 2D array tips are crucial for scanning probe lithography.
- Maintaining parallel tip arrays at a consistent contact point is a major challenge for large-area nanolithography.
Purpose of the Study:
- To introduce a novel leveling method for polymer pen lithography.
- To address the challenge of uniform nanoscale patterning with large tip arrays.
Main Methods:
- Demonstration of polymer pen lithography with a novel leveling system.
- Integration of a multipoint force sensing structure into the tip holder to manage applied forces.
- Development of a position-sensitive, automated leveling system.
Main Results:
- Achieved a 0.001° slope of feature edge length variation over 1 cm wide tip arrays.
- Demonstrated high-precision control over tip array parallelism and contact.
- The leveling method effectively accounts for applied force magnitude and direction.
Conclusions:
- The novel leveling method significantly improves uniformity in nanoscale patterning using polymer pen lithography.
- This automated, high-precision approach is applicable to various scanning probe lithography techniques.
- Enables advancements in "desktop nanofabrication" for large-area applications.
