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Mueller matrix imaging ellipsometry for nanostructure metrology.

Shiyuan Liu, Weichao Du, Xiuguo Chen

    Optics Express
    |July 21, 2015
    PubMed
    Summary
    This summary is machine-generated.

    Mueller matrix imaging ellipsometry (MMIE) enables fast, non-destructive nanostructure metrology. This technique overcomes limitations of traditional optical scatterometry for high-volume nanomanufacturing by providing pixel-sized measurements and wide-area mapping.

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    Area of Science:

    • Metrology
    • Nanotechnology
    • Optical Physics

    Background:

    • Effective process control in high-volume nanomanufacturing requires fast, inexpensive, nondestructive, and reliable nanometer-scale feature measurements.
    • Optical scatterometry offers high throughput, low cost, and minimal sample damage but is limited by illumination spot size and inefficient wide-area mapping.
    • Existing methods struggle to provide detailed, large-scale characterization of nanostructures.

    Purpose of the Study:

    • To introduce Mueller matrix imaging ellipsometry (MMIE) as a powerful tool for nanostructure metrology.
    • To overcome the limitations of conventional optical scatterometry in terms of spot size and mapping efficiency.
    • To enable efficient, high-resolution characterization of nanostructures for advanced manufacturing.

    Main Methods:

    • Integration of conventional imaging techniques with Mueller matrix ellipsometry.
    • Development and application of an in-house Mueller matrix imaging ellipsometer.
    • Pixel-sized illumination and parallel ellipsometric analysis for comprehensive data acquisition.

    Main Results:

    • Demonstrated Mueller matrix measurement and analysis for nanostructures with pixel-sized illumination spots.
    • Successfully constructed parameter maps of nanostructures over a wide area with pixel-sized lateral resolution.
    • Validated the capability of MMIE for detailed nanostructure metrology.

    Conclusions:

    • Mueller matrix imaging ellipsometry (MMIE) is a promising technique for nanostructure metrology in high-volume nanomanufacturing.
    • MMIE effectively addresses the limitations of traditional optical scatterometry, enabling efficient and high-resolution wide-area mapping.
    • The developed MMIE system provides a powerful tool for precise characterization of nanostructures.