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Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing.

Arsenty Kaganskiy1, Manuel Gschrey1, Alexander Schlehahn1

  • 1Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstraße 36, D-10623 Berlin, Germany.

The Review of Scientific Instruments
|August 3, 2015
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Summary

We developed an advanced electron-beam lithography technique using low-temperature cathodoluminescence spectroscopy. This method precisely fabricates and evaluates nanophotonic structures, optimizing non-classical light sources by selecting single quantum dots (QDs).

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Area of Science:

  • Nanophotonics
  • Quantum Optics
  • Materials Science

Background:

  • Deterministic fabrication of nanophotonic structures is crucial for advanced optical devices.
  • Precise selection and integration of quantum emitters, like quantum dots (QDs), are essential for optimizing light sources.
  • High-resolution optical characterization at low temperatures is needed to understand quantum dot properties.

Purpose of the Study:

  • To develop and demonstrate an in-situ electron-beam lithography technique for deterministic fabrication of nanophotonic structures.
  • To enable quantitative evaluation of nanophotonic devices by integrating pre-selected quantum dots (QDs).
  • To optimize non-classical light sources by selecting single QDs with specific optical and quantum properties.

Main Methods:

  • A two-step electron-beam lithography process combining cathodoluminescence (CL) spectroscopy and nanofabrication.
  • In-situ, low-temperature, high-resolution CL spectroscopy for optical study and selection of target QDs.
  • Precise retrieval of QD locations and integration into lithographically defined nanostructures.

Main Results:

  • Demonstration of a technology platform for deterministic fabrication and quantitative evaluation of nanophotonic structures.
  • Successful pre-process determination of single QD properties including emission energies, fine-structure splitting, and carrier dynamics.
  • Enabling direct comparison of QD optical properties before and after integration into nanostructures.

Conclusions:

  • The developed technique allows for precise fabrication and characterization of nanophotonic devices utilizing pre-selected quantum dots.
  • This approach is highly beneficial for the optimization of cavity-enhanced quantum devices and non-classical light sources.
  • The platform provides detailed insights into quantum optical properties, facilitating the advancement of quantum technologies.