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Experimental and Modeling Study of Solvent Diffusion in PDMS for Nanoparticle-Polymer Cosuspension Imprint
Michelle Gervasio1, Kathy Lu1, Richey Davis2
1Department of Materials Science and Engineering, Virginia Polytechnic Institute and State University , Blacksburg, Virginia 24061, United States.
Langmuir : the ACS Journal of Surfaces and Colloids
|August 25, 2015
Summary
This study reveals how anisole solvent moves within polydimethylsiloxane (PDMS) stamps during ZnO-poly(methyl methacrylate) (PMMA) hybrid imprint lithography. Higher solids loading in suspensions increases solvent penetration into the PDMS stamp.
Area of Science:
- Materials Science
- Polymer Science
- Nanotechnology
Background:
- Imprint lithography is a key nanofabrication technique.
- Understanding solvent-polymer interactions is crucial for process control.
- Polydimethylsiloxane (PDMS) is a common stamp material in lithography.
Purpose of the Study:
- To investigate solvent migration in PDMS stamps during ZnO-PMMA hybrid imprint lithography.
- To quantify the effect of suspension solids loading on solvent uptake.
- To analyze the diffusion behavior of anisole solvent in PDMS.
Main Methods:
- Utilized ZnO-poly(methyl methacrylate) (PMMA) hybrid suspensions with varying solids loading.
- Employed laser confocal microscopy to measure solvent penetration depth.
- Evaluated anisole solvent uptake in PDMS stamps over time.
Main Results:
- Suspension solids loading significantly impacts anisole saturation depth in PDMS.
- Low solids loading exhibited non-Fickian diffusion, consistent with rubbery-elastic polymer models.
- High solids loading showed sigmoidal diffusion, indicative of rubbery-viscous behavior and increased swelling.
Conclusions:
- Solvent diffusion in PDMS stamps is dependent on suspension solids loading.
- Increased swelling at higher solids loadings enhances anisole diffusion rates.
- Findings provide insights into optimizing imprint lithography processes involving hybrid suspensions.
