A study of X-ray multiple diffraction by means of section topography

Area of Science:

• Solid State Physics
• Crystallography
• Materials Science

Background:

• X-ray diffraction is crucial for analyzing crystal structures.
• Section topography visualizes crystal defects and strain.
• Multiple diffraction phenomena can complicate X-ray analysis.

Purpose of the Study:

• To investigate the influence of X-ray multiple diffraction on section topography fringes in silicon.
• To analyze specific multiple diffraction cases at low azimuthal angles.
• To validate experimental findings with accurate computer simulations.

Main Methods:

• Theoretical calculations of X-ray diffraction.
• Experimental section topography using a laboratory X-ray source.
• Computer simulations of section topograms under multiple diffraction conditions.

Main Results:

• Two distinct multiple diffraction cases were identified at zero and near-zero azimuthal angles.
• Computer simulations revealed complex interference fringe structures in multiple diffraction regions.
• Experimental results showed a characteristic fringe inclination, matching simulations.

Conclusions:

• X-ray multiple diffraction profoundly impacts section topography fringe patterns in silicon.
• The azimuthal angle critically influences fringe structure under multiple diffraction.
• Accurate simulations are vital for interpreting complex X-ray diffraction topograms.