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Polymer Stamps for Imprinting Nanopatterns in Polymer Substrate
Journal of Nanoscience and Nanotechnology
|September 3, 2015
Summary
Using polymer stamps for nanoimprinting improves pattern fidelity and reduces substrate deformation. TPGDA-based UV resin stamps enabled successful imprinting of nanoscale features alongside macro-scale patterns.
Area of Science:
- Materials Science
- Nanotechnology
- Polymer Science
Background:
- Traditional metallic or silicone stamps for multiscale pattern imprinting cause substrate deformation and pattern loss, especially at the nanoscale.
- High adhesion and thermal stress during imprinting can damage expensive stamps.
Purpose of the Study:
- To investigate the use of polymer stamps for improved fidelity in multiscale pattern replication.
- To compare the replication fidelity of different polymer stamp materials in thermal imprinting.
Main Methods:
- Fabrication of polymer stamps from polydimethylsiloxane (PDMS), PPGDA-based UV resin, and TPGDA-based UV-resin using a master with nanofluidic structures.
- Comparison of replication fidelity from master to polymer stamps and finally to a poly(methyl methacrylate) (PMMA) substrate via thermal imprinting.
Main Results:
- The thermal imprinting step was identified as the primary source of pattern fidelity loss.
- Polymer stamps with higher Young's moduli demonstrated superior pattern transfer fidelity.
- TPGDA-based UV resin stamps successfully replicated multiscale structures, including nanochannels as small as 70 nm, onto a PMMA substrate.
Conclusions:
- Polymer stamps offer a viable solution to reduce adhesion and thermal stress in nanoimprinting.
- TPGDA-based UV resin stamps are effective for high-fidelity, multiscale pattern transfer, enabling simultaneous imprinting of micro and nanoscale features.
