A more reliable measurement method for metal/graphene contact resistance

Shaoqing Wang1, Dacheng Mao1, Zhi Jin1

  • 1Department of Microwave IC, Institute of Microelectronics, Chinese Academy of Sciences, No. 3, Beitucheng West Road, Beijing 100029, People's Republic of China.

Nanotechnology
|September 18, 2015
PubMed