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Detection of overlay error in double patterning gratings using phase-structured illumination.

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    Coherent, phase-structured illumination effectively detects nanometer-scale overlay errors in double-patterned resist gratings. Simulations show this method reliably measures error magnitude and direction, even with noise.

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    Area of Science:

    • Optics and Photonics
    • Semiconductor Manufacturing
    • Metrology

    Background:

    • Double patterning is crucial for advanced semiconductor fabrication.
    • Overlay error is a critical parameter affecting yield in lithography.
    • Accurate detection of small overlay errors is essential for process control.

    Purpose of the Study:

    • To investigate the benefits of coherent, phase-structured illumination for overlay error detection.
    • To evaluate the capability of detecting magnitude and direction of overlay errors in resist gratings.
    • To assess the reliability of measurement approaches under noisy conditions.

    Main Methods:

    • Utilizing simulations to model coherent, phase-structured illumination.
    • Analyzing intensity and phase distribution within a high numerical aperture microscope's focal spot.
    • Investigating a wide range of grating types.
    • Testing two distinct measurement approaches.

    Main Results:

    • Coherent, phase-structured illumination demonstrates significant benefits for overlay error detection.
    • The method is capable of detecting overlay errors in the nanometer range.
    • Both magnitude and direction of overlay errors can be determined.
    • The presented measurement approaches show reliability even with white Gaussian noise.

    Conclusions:

    • Coherent, phase-structured illumination is a promising technique for high-precision overlay metrology.
    • The simulation-based evaluation provides a robust understanding of the method's capabilities.
    • The findings support the application of this technique in advanced semiconductor manufacturing for improved process control.