Macroparticles Reduction Using Filter Free Cathodic Vacuum Arc Deposition Method in ZnO Thin Films.
Journal of Nanoscience and Nanotechnology
|September 29, 2015
Summary
This study introduces a novel method to reduce macroparticles in zinc oxide (ZnO) thin films using filter-free cathodic vacuum arc deposition. Increasing the distance between the cathode spot and substrate effectively minimizes macroparticles, yielding high-quality films.
Area of Science:
- Materials Science
- Thin Film Deposition
- Surface Engineering
Background:
- Macroparticles in thin films can degrade device performance.
- Existing methods for macroparticle reduction often require complex setups like cooling systems.
Purpose of the Study:
- To develop a simpler method for reducing macroparticles in zinc oxide (ZnO) thin films.
- To investigate the effect of deposition parameters on macroparticle formation.
Main Methods:
- Utilized filter-free cathodic vacuum arc deposition at low arc current.
- Varied the cathode spot to substrate distance (10-20 cm).
- Employed Field Emission Scanning Electron Microscopy with Energy Dispersive X-ray Spectroscopy (FESEM-EDX) for analysis.
Main Results:
- Successfully reduced macroparticles in ZnO thin films without cooling.
- Observed a decrease in macroparticle population with increasing cathode spot to substrate distance.
- Characterized ZnO films exhibiting good structural and optical properties.
Conclusions:
- The proposed method offers an effective and simple approach to minimize macroparticles in ZnO thin films.
- Optimizing deposition distance is crucial for high-quality, macroparticle-free films.
