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Permeability- and Surface-Energy-Tunable Polyurethane Acrylate Molds for Capillary Force Lithography
Dongchul Suh1, Hyowon Tak2,3, Se-jin Choi4
1Department of Chemical Engineering, Hoseo University , Asan-si, Chungcheongnam-do 31499, Republic of Korea.
ACS Applied Materials & Interfaces
|September 29, 2015
Summary
Researchers developed a new mold material for capillary-force lithography (CFL). This material allows simultaneous control over surface energy and gas permeability, enabling finer and more adaptable nanopatterning.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Chemistry
Background:
- Capillary-force lithography (CFL) is a technique for micro- and nanopatterning.
- The performance of CFL relies heavily on mold properties like surface energy and gas permeability.
- Simultaneously controlling these two properties in traditional CFL molds is challenging.
Purpose of the Study:
- To introduce a novel polyurethane acrylate (PUA) based mold material, termed "capillary-force material" (CFM), for CFL.
- To demonstrate that the surface energy and gas permeability of CFM molds can be precisely modulated.
- To overcome geometric limitations in nanopatterning, especially on curved surfaces.
Main Methods:
- Developed CFM molds with controllable cross-linking degrees.
- Investigated the relationship between cross-linking density, surface energy, and air permeability.
- Evaluated the performance of CFM molds for patterning at different functionalities and on various substrates.
Main Results:
- Increased cross-linking density in CFM molds led to decreased surface energy and air permeability.
- High functionality CFM molds enabled fine and rapid patterning due to high capillary rise and stiffness.
- Low functionality CFM molds facilitated conformal contact and patterning on curved surfaces.
Conclusions:
- The developed CFM molds offer tunable interfacial properties for enhanced CFL.
- This approach allows for precise control over patterning resolution and adaptability.
- CFMs significantly expand the scope of CFL for sub-100 nm and curved-surface nanopatterning.

