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Cross-linked Polymer-Blend Gate Dielectrics through Thermal Click Chemistry
Shengxia Li1, Wei Tang2, Weimin Zhang3
1Shanghai Key Lab of Polymer and Electrical Insulation, Department of Polymer Science and Engineering, School of Chemistry and Chemical Engineering, Shanghai JiaoTong University, Shanghai 200240 (China).
Abstract:
New cross-linking reagents were synthesized and mixed with polystyrene (PS) in solution to form a blend. Thin-films were spin-coated from the blend and then cross-linked by thermal activation at relatively low temperature (100 °C) to form cross-linked gate dielectrics. This new method is compatible with plastic substrates in flexible electronics. The azide and alkyne cross-linking reagents are kinetically stable at room temperature, so any premature cross-linking is avoided during processing. This method also significantly improved the dielectric performances of PS thin films. Solution-processed top-gate organic field-effect transistor devices with indacenodithiophene-benzothiadiazole copolymer as semiconductor layer and the cross-linked PS blend as dielectric layer showed improved performances with lower gate leakages and higher operation stabilities than devices with neat PS film as dielectric layer.

