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    A new algorithm quantitatively extracts object wave amplitude and phase from varied imaging conditions. This method, applicable to Extreme Ultraviolet Lithography (EUV) mask defect analysis, improves quantitative phase imaging.

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    Area of Science:

    • Optics and Imaging
    • Materials Science
    • Nanotechnology

    Background:

    • Quantitative phase imaging is crucial for analyzing microscopic structures.
    • Existing methods struggle with diverse illumination and imaging conditions.
    • Accurate defect characterization in Extreme Ultraviolet Lithography (EUV) masks is vital for semiconductor manufacturing.

    Purpose of the Study:

    • To develop a general algorithm for quantitative extraction of object wave amplitude and phase.
    • To extend the algorithm beyond the weak object approximation.
    • To demonstrate the algorithm's efficacy on EUV multilayer mask defects.

    Main Methods:

    • Utilizing a weak object transfer function incorporating arbitrary pupil functions and partially coherent illumination.
    • Employing an iterative algorithm to extend the approach beyond the weak object regime.
    • Applying the method to measurements from an EUV zone plate microscope with standard and phase contrast zone plates.

    Main Results:

    • Successfully combined measurements from various conditions to quantitatively extract amplitude and phase.
    • Demonstrated the algorithm's capability in analyzing Extreme Ultraviolet Lithography (EUV) multilayer mask defects.
    • Validated the method using both standard and Zernike phase contrast zone plates.

    Conclusions:

    • The presented algorithm offers a robust method for quantitative phase imaging under diverse conditions.
    • This technique significantly enhances the analysis of defects in EUV masks.
    • The iterative extension broadens the applicability of quantitative phase retrieval.