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Updated: Mar 31, 2026

Flow-assisted Dielectrophoresis: A Low Cost Method for the Fabrication of High Performance Solution-processable Nanowire Devices
Published on: December 7, 2017
Resolving ambiguities in nanowire field-effect transistor characterization.
Sebastian Heedt1, Isabel Otto1, Kamil Sladek1
1Peter Grünberg Institut (PGI-9) and JARA-Fundamentals of Future Information Technology, Forschungszentrum Jülich, 52425 Jülich, Germany. s.heedt@fz-juelich.de th.schaepers@fz-juelich.de.
This study models indium arsenide (InAs) nanowires, revealing surface states are crucial for carrier concentration and mobility. The new method offers a simpler alternative to Hall effect measurements for nanowire analysis.
Area of Science:
- Semiconductor Physics
- Materials Science
- Nanotechnology
Background:
- Indium arsenide (InAs) nanowires are crucial for advanced electronic devices.
- Accurate characterization of carrier transport in nanowires is challenging.
- Surface states significantly influence the electrical properties of nanowires.
Purpose of the Study:
- To develop a comprehensive model for InAs nanowires accounting for device geometry and surface states.
- To investigate the impact of surface states on charge distribution and gate control.
- To provide an accurate method for determining electron concentration and mobility in nanowires.
Main Methods:
- Finite element method (FEM) modeling of InAs nanowire devices.
- Incorporation of actual device geometry, semiconducting channel properties, and surface/interface states.
- Analysis of field-effect transistor (FET) measurements with dual gates of varying couplings.
Main Results:
- Gate coupling is significantly affected by concurrent coupling to surface/interface states.
- Identified the surface state density responsible for a shallow quantum well at the nanowire surface.
- Achieved consistent electron concentration and mobility values using the actual surface state density.
Conclusions:
- The developed model accurately captures carrier behavior in InAs nanowires.
- The study highlights the critical role of surface states in undoped nanowires.
- This approach provides a reliable and simplified alternative to conventional Hall effect measurements for nanowire characterization.
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