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Updated: Mar 31, 2026

Optimized Fabrication Procedure for High-Quality Graphene-based Moiré Superlattice Devices
Published on: July 11, 2025
Wonho Lee1, Houk Jang1, Bongkyun Jang2
1School of Electrical and Electronic Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 120-749, South Korea.
Ultrathin silicon integrated circuits with graphene interconnects maintain electrical performance under strain. Graphene protects silicon devices from over 10% strain by concentrating stress on interconnects.
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