Related Experiment Video
Updated: Mar 30, 2026

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization
Published on: July 12, 2016
Focused electron beam induced etching of copper in sulfuric acid solutions
Lindsay Boehme1, Matthew Bresin, Aurélien Botman
1Department of Electrical and Computer Engineering, University of Kentucky, 453 F. Paul Anderson Tower, Lexington, KY 40506, USA.
Abstract:
We show here that copper can be locally etched by an electron-beam induced reaction in a liquid. Aqueous sulfuric acid (H2SO4) is utilized as the etchant and all experiments are conducted in an environmental scanning electron microscope. The extent of etch increases with liquid thickness and dose, and etch resolution improves with H2SO4 concentration. This approach shows the feasibility of liquid phase etching for material selectivity and has the potential for circuit editing.
Related Concept Videos
Electrodeposition
Electrodeposition can...
Preparation of Samples for Electron Microscopy
Microbial Leaching
Standard Electrode Potentials
Precipitation and Co-precipitation

