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Ultralow-Loss CMOS Copper Plasmonic Waveguides.

Dmitry Yu Fedyanin1, Dmitry I Yakubovsky1, Roman V Kirtaev1

  • 1Laboratory of Nanooptics and Plasmonics, Moscow Institute of Physics and Technology , 9 Institutsky Lane, Dolgoprudny 141700, Russian Federation.

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Ultralow-loss copper plasmonic waveguides compatible with CMOS technology were fabricated. These waveguides offer superior performance for integrating nanoelectronics and photonics on a single chip.

Keywords:
CMOS plasmonicsCopper plasmonicshybrid plasmonic waveguidenear-field optical microscopyplasmonic nanocircuitry

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Area of Science:

  • Photonics and Nanotechnology
  • Materials Science

Background:

  • Surface plasmon polaritons enable light manipulation below the diffraction limit, crucial for miniaturizing optical components.
  • Current plasmonics predominantly use noble metals, hindering integration with silicon microelectronics and photonics manufacturing.

Purpose of the Study:

  • To develop ultralow-loss plasmonic waveguides using copper.
  • To achieve compatibility with complementary metal-oxide semiconductor (CMOS) fabrication processes.
  • To enable integration of plasmonic devices with silicon-based technologies.

Main Methods:

  • Fabrication of copper plasmonic waveguides using a CMOS-compatible process.
  • Characterization of waveguide performance, including propagation length and mode confinement.

Main Results:

  • Demonstrated ultralow-loss copper plasmonic waveguides.
  • Achieved propagation lengths exceeding 40 μm in the telecommunication spectral range.
  • Obtained deep subwavelength mode confinement (∼λ(2)/50).
  • Copper waveguides outperformed gold waveguides in performance.

Conclusions:

  • The developed copper plasmonic waveguides are compatible with CMOS technology.
  • These waveguides provide a pathway for integrating plasmonics with silicon microelectronics and photonics.
  • This breakthrough supports the development of a CMOS plasmonic platform for future electronic chips.