Investigation on Behavior of Macro-Particles in TiN Film by Arc Ion Plating

Macroparticle contamination deteriorates the qualities and performances of protective coatings by arc ion plating, resulting in a limitation in their applications. In this work, the effects of transverse magnetic field (TMF), pulsed bias, gas pressure, and substrate position on behavior of the macro-particles (MPs) in TiN films are quantitatively investigated. It is demonstrated that the key factor of the deposition process on the MPs behavior is magnetic field, which controls the movement of arc spot significantly. At relatively low magnetic field intensity, the MPs behavior is greatly influenced by the other three process parameters. The sensibilities of the three parameters on MPs behavior are decreased with the increasing magnetic field intensity. At high magnetic field intensity, the MPs distribution keeps almost the same even when the other parameters are varied.