Influence of void-free perovskite capping layer on the charge recombination process in high performance CH3NH3PbI3

Kunwu Fu1, Christopher T Nelson2, Mary Cooper Scott2

  • 1Energy Research Institute @ NTU (ERI@N), Nanyang Technological University, Research Techno Plaza, 50 Nanyang Drive, 637553, Singapore and School of Materials Science and Engineering, Nanyang Technological University, Block N4.1, 50 Nanyang Avenue, 639798, Singapore. nripan@ntu.edu.sg lydiawong@ntu.edu.sg.

Nanoscale
|February 3, 2016
PubMed