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Fabrication And Characterization Of Photonic Crystal Slow Light Waveguides And Cavities
Published on: November 30, 2012
Printable photonic crystals with high refractive index for applications in visible light
Giuseppe Calafiore1, Quentin Fillot, Scott Dhuey
1aBeam Technologies, 22290 Foothill Blvd. St2, Hayward, CA 94541, USA. Polytechnic University of Turin, Corso Duca degli Abruzzi 24, 10129, Turin, Italy.
Abstract:
Nanoimprint lithography (NIL) of functional high-refractive index materials has proved to be a powerful candidate for the inexpensive manufacturing of high-resolution photonic devices. In this paper, we demonstrate the fabrication of printable photonic crystals (PhCs) with high refractive index working in the visible wavelengths. The PhCs are replicated on a titanium dioxide-based high-refractive index hybrid material by reverse NIL with almost zero shrinkage and high-fidelity reproducibility between mold and printed devices. The optical responses of the imprinted PhCs compare very well with those fabricated by conventional nanofabrication methods. This study opens the road for a low-cost manufacturing of PhCs and other nanophotonic devices for applications in visible light.

