Maskless, High-Precision, Persistent, and Extreme Wetting-Contrast Patterning in an Environmental Scanning Electron...

Area of Science:

• Materials Science
• Surface Science
• Microscopy

Background:

• Controlling surface wettability is crucial for various applications.
• Existing methods for creating wetting patterns can be complex or lack precision.
• Environmental Scanning Electron Microscopy (ESEM) offers unique capabilities for in-situ studies.

Purpose of the Study:

• To develop a maskless, programmable direct electron beam writing method for creating wetting patterns.
• To achieve high-precision control over superhydrophilic and superhydrophobic surface areas.
• To investigate the potential influence of electron beam-induced plasma on wetting phenomena.

Main Methods:

• Utilizing an environmental scanning electron microscope (ESEM) for direct electron beam writing.
• Employing a programmable system for maskless pattern generation.
• Characterizing the resulting wetting patterns by measuring contact angles.

Main Results:

• Successfully fabricated high-precision superhydrophilic-superhydrophobic wetting patterns.
• Achieved a significant contact angle contrast of 152° between the two wetting states.
• Demonstrated the capability to create patterns with linewidths below 1 μm.
• Observed potential effects of electron beam-induced local plasma on wetting behavior.

Conclusions:

• The reported direct electron beam writing method offers a versatile and precise approach for fabricating complex wetting patterns.
• This technique enables the creation of surfaces with distinct superhydrophilic and superhydrophobic regions, useful for microfluidics and coatings.
• The findings suggest that electron beam-induced plasma in ESEM can be a factor in microscopic wetting studies and pattern formation.