Density-functional theory molecular dynamics simulations of a-HfO2/Ge(100)(2 × 1) and a-ZrO2/Ge(100)(2 × 1) interface

E A Chagarov1, L Porter2, A C Kummel1

  • 1Department of Chemistry and Biochemistry, University of California, San Diego, La Jolla, California 92093, USA.

Summary

Density-functional theory molecular dynamics simulations reveal that germanium oxide (GeOx) interlayers can create detrimental band-edge states at high-k dielectric/Ge interfaces, reducing band gaps. Optimized processing can yield electronically passive interfaces without GeOx, crucial for advanced semiconductor devices.