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Density-functional theory molecular dynamics simulations of a-HfO2/Ge(100)(2 × 1) and a-ZrO2/Ge(100)(2 × 1) interface
E A Chagarov1, L Porter2, A C Kummel1
1Department of Chemistry and Biochemistry, University of California, San Diego, La Jolla, California 92093, USA.
Density-functional theory molecular dynamics simulations reveal that germanium oxide (GeOx) interlayers can create detrimental band-edge states at high-k dielectric/Ge interfaces, reducing band gaps. Optimized processing can yield electronically passive interfaces without GeOx, crucial for advanced semiconductor devices.
Area of Science:
- Materials Science
- Computational Physics
- Semiconductor Device Physics
Background:
- Germanium (Ge) is a promising material for advanced transistors due to its high carrier mobility.
- High-k dielectrics are essential for scaling down gate oxides in Ge-based metal-oxide-semiconductor field-effect transistors (MOSFETs).
- The interface properties between high-k dielectrics and Ge significantly impact device performance, particularly concerning interfacial states.
Purpose of the Study:
- To investigate the structural and electronic properties of amorphous hafnium oxide (a-HfO2) and zirconium oxide (a-ZrO2) interfaces with Ge(001).
- To evaluate the role of a germanium oxide (GeOx) interface interlayer on the interface properties.
- To determine the conditions for forming electronically passive interfaces for Ge-based devices.
Main Methods:
- Utilized density-functional theory (DFT) molecular dynamics (MD) simulations.
- Employed a hybrid classical-DFT MD 'melt-and-quench' approach to generate realistic oxide/Ge stacks.
- Simulated annealing at 700 K, followed by cooling and relaxation, to form realistic interfaces.
Main Results:
- Stacks with a GeOx interlayer exhibited band-edge states, reducing band gaps by 0%-30%, primarily due to under-coordinated Ge atoms.
- These band-edge states resulted from deformation, intermixing, and bond-breaking within or near the GeOx layer.
- All investigated stacks were free of midgap states; however, the presence of GeOx introduced undesirable electronic states.
Conclusions:
- Electronically passive interfaces can be formed either directly between high-k dielectrics and Ge or with a GeO2 monolayer.
- Careful processing is required to avoid creating or to properly passivate under-coordinated Ge atoms and distorted Ge bonds.
- The study confirms that while GeOx interlayers are common, forming an oxide/Ge interface without GeOx is feasible and potentially beneficial.
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