Competitive effects of oxygen vacancy formation and interfacial oxidation on an ultra-thin HfO2-based resistive

Hisao Nakamura1, Yoshihiro Asai2

  • 1Research Planning Office, Department of Materials and Chemistry, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba Central 1, Tsukuba, Ibaraki 305-8560, Japan. hs-namaura@aist.go.jp and Research Center for Computational Design of Advanced Materials, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba Central 2, Tsukuba, Ibaraki 305-8568, Japan.

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