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Published on: October 23, 2018
High-Performance p-Type Black Phosphorus Transistor with Scandium Contact
Ling Li1, Michael Engel2, Damon B Farmer2
1Department of Electrical Engineering, Stanford University , Stanford, California 94305, United States.
Vacuum annealing significantly boosts black phosphorus transistor performance with scandium contacts, achieving record current density. Conversely, Al2O3 capping degrades performance, highlighting the importance of contact engineering for these novel electronic devices.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanotechnology
Background:
- Black phosphorus (BP) is a promising 2D material for next-generation electronics due to its high carrier mobility.
- Understanding the impact of processing and environmental factors on BP transistor performance is crucial for device fabrication.
- Metal contact engineering is vital for optimizing charge injection and transport in BP devices.
Purpose of the Study:
- To investigate the effects of vacuum annealing and Al2O3 capping on the electrical performance of black phosphorus transistors.
- To elucidate the influence of moisture on black phosphorus metal contacts.
- To determine the optimal black phosphorus film thickness for transistors with scandium contacts.
Main Methods:
- Fabrication and characterization of few-layer black phosphorus transistors with scandium and gold contacts.
- Electrical measurements under various conditions: as-fabricated, vacuum annealed, and Al2O3 capped.
- Analysis of device performance metrics including current density, on/off ratio, subthreshold swing, and hysteresis.
Main Results:
- A record current density of 580 μA/μm was achieved for BP transistors with scandium contacts after 400 K vacuum annealing.
- Vacuum annealing improved on-state current and Ion/Ioff ratio by one order of magnitude and subthreshold swing by ~2.5×.
- Al2O3 capping degraded transistor performance, reducing on-state current and Ion/Ioff ratio by 5× and 3×, respectively.
- Optimal BP film thickness for scandium contacts was found to be ~10 nm.
- All transistors with scandium contacts exhibited p-type behavior, indicating Fermi level pinning near the valence band.
Conclusions:
- Vacuum annealing is a highly effective method for enhancing the performance of black phosphorus transistors with scandium contacts.
- Al2O3 capping negatively impacts BP transistor performance, suggesting sensitivity to dielectric interfaces and potential degradation pathways.
- Scandium contacts promote stable p-type behavior in black phosphorus transistors, irrespective of flake thickness, simplifying device design and operation.
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