Thermal singularity and contact line motion in pool boiling: Effects of substrate wettability

The dynamic van der Waals theory [Phys. Rev. E 75, 036304 (2007)] is employed to model the growth of a single vapor bubble in a superheated liquid on a flat homogeneous substrate. The bubble spreading dynamics in the pool boiling regime has been numerically investigated for one-component van der Waals fluids close to the critical point, with a focus on the effect of the substrate wettability on bubble growth and contact line motion. The substrate wettability is found to control the apparent contact angle and the rate of bubble growth (the rate of total evaporation), through which the contact line speed is determined. An approximate expression is derived for the contact line speed, showing good agreement with the simulation results. This demonstrates that the contact line speed is primarily governed by (1) the circular shape of interface (for slow bubble growth), (2) the constant apparent contact angle, and (3) the constant bubble growth rate. It follows that the contact line speed has a sensitive dependence on the substrate wettability via the apparent contact angle which also determines the bubble growth rate. Compared to hydrophilic surfaces, hydrophobic surfaces give rise to a thinner shape of bubble and a higher rate of total evaporation, which combine to result in a much faster contact line speed. This can be linked to the earlier formation of a vapor film and hence the onset of boiling crisis.