High-Performance WSe2 Field-Effect Transistors via Controlled Formation of In-Plane Heterojunctions

Monolayer WSe2 is a two-dimensional (2D) semiconductor with a direct band gap, and it has been recently explored as a promising material for electronics and optoelectronics. Low field-effect mobility is the main constraint preventing WSe2 from becoming one of the competing channel materials for field-effect transistors (FETs). Recent results have demonstrated that chemical treatments can modify the electrical properties of transition metal dichalcogenides (TMDCs), including MoS2 and WSe2. Here, we report that controlled heating in air significantly improves device performance of WSe2 FETs in terms of on-state currents and field-effect mobilities. Specifically, after being heated at optimized conditions, chemical vapor deposition grown monolayer WSe2 FETs showed an average FET mobility of 31 cm(2)·V(-1)·s(-1) and on/off current ratios up to 5 × 10(8). For few-layer WSe2 FETs, after the same treatment applied, we achieved a high mobility up to 92 cm(2)·V(-1)·s(-1). These values are significantly higher than FETs fabricated using as-grown WSe2 flakes without heating treatment, demonstrating the effectiveness of air heating on the performance improvements of WSe2 FETs. The underlying chemical processes involved during air heating and the formation of in-plane heterojunctions of WSe2 and WO3-x, which is believed to be the reason for the improved FET performance, were studied by spectroscopy and transmission electron microscopy. We further demonstrated that, by combining the air heating method developed in this work with supporting 2D materials on the BN substrate, we achieved a noteworthy field-effect mobility of 83 cm(2)·V(-1)·s(-1) for monolayer WSe2 FETs. This work is a step toward controlled modification of the properties of WSe2 and potentially other TMDCs and may greatly improve device performance for future applications of 2D materials in electronics and optoelectronics.