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Electrochemical deposition of highly-conducting metal dithiolene films
Emily Allwright1, Georg Silber1, Jason Crain2
1EaStCHEM School of Chemistry, The University of Edinburgh, King's Buildings, David Brewster Road, Edinburgh EH9 3FJ, UK. neil.robertson@ed.ac.uk.
Abstract:
Electrochemical deposition has been used to prepare a thin film of neutral 4',4-(3-alkyl)-thiophene-5',5-hydogen-nickel and copper dithiolenes (Ni-C2, Cu-C2). The application of molecular electrodeposition provides a means to solution process molecular semiconductors of poor solubility, which results from the strong intermolecular interaction required for charge transport. Both Ni-C2 and Cu-C2 form continuous thin films that show intense NIR absorptions, extending to 1800 nm and 2000 nm respectively giving evidence for the strong intermolecular interactions in the solid state. Both films are highly conducting and temperature dependence of resistance gave an activation energy of 0.42 eV and 0.072 eV respectively, with the near-metallic behaviour of Cu-C2 attributed to the additional presence of an unpaired electron.
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