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Published on: May 14, 2016
The immiscibility of InAlN ternary alloy
Guijuan Zhao1, Xiaoqing Xu1, Huijie Li1
1Key Laboratory of Semiconductor Materials Science, and Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People's Republic of China.
This study investigates Indium Aluminum Nitride (InAlN) immiscibility using two models, identifying optimal growth conditions and suitable substrates. Results guide the epitaxial growth of InAlN alloys for various applications.
Area of Science:
- Materials Science
- Solid State Physics
- Thermodynamics
Background:
- Indium Aluminum Nitride (InAlN) is a ternary alloy with tunable properties.
- Understanding InAlN immiscibility is crucial for controlled material synthesis and device fabrication.
Purpose of the Study:
- To investigate the immiscibility of InAlN ternary alloy.
- To determine appropriate concentration regions for epitaxial growth.
- To analyze the influence of different substrates on InAlN stability.
Main Methods:
- Utilized two thermodynamic models: valence force field and regular solution model.
- Calculated spinodal and binodal curves for InAlN.
- Incorporated mismatch strain into Gibbs free energy calculations.
Main Results:
- Determined spinodal and binodal curves, revealing InAlN immiscibility.
- Identified an InN solubility of approximately 10% at 1000 K.
- Found that substrates like Si, Al2O3, InN, GaN, and AlN stabilize InAlN, reducing the upper critical solution temperature.
- Recommended InN and GaN for In-rich InAlN, and AlN and GaN for Al-rich InAlN.
Conclusions:
- The study provides critical insights into InAlN phase diagrams and growth parameters.
- Substrate selection significantly impacts InAlN stability and composition.
- InN, GaN, AlN, Si, and Al2O3 are identified as potential substrates for specific InAlN compositions and applications.
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